This talk was presented at SEMATECH AEC/APC symposium, a forum attended by the leading semiconductor manufacturers and semiconductor manufacturing tool vendors to discuss the issues of Advanced Equipment Control (AEC) and Advanced Process Control (APC).  The talk discusses new powerful and easy-to-use tools for estimating systematic trends in Fault Detection and Classification (FDC) data. The tools could enable many APC/FDC applications by extracting hidden trends from data to provide accurate alerting, diagnostics, prognostic trend monitoring, and condition-based maintenance (CBM). The tools are proven in process industries and in aerospace applications (commercial, military, and NASA).

Downloadable paper in PDF format.